招聘

EUV photomask inspection and management engineering
Hiroshima - Fab 15, Japan
·
On-site
·
Full-time
·
2w ago
Benefits & Perks
•Healthcare
•Dental
•Vision
•Healthcare
Required Skills
Problem-solving
Process improvement
Quality management
English communication
Project management
**Our vision is to transform how the world uses information to enrich life for all. **
Micron Technology is a world leader in innovating memory and storage solutions that accelerate the transformation of information into intelligence, inspiring the world to learn, communicate and advance faster than ever.
F15 ATE(Alpha Technology Engineering)Photo エンジニアは、研究開発チームから移管される新技術の量産導入、良品率(Yield)の向上、サイクルタイム短縮を推進し、関連するすべての部門および DRAM ネットワークと連携しながら成果を創出する役割を担います。
また、ATE Photo EUV フォトマスクエンジニアとして、最先端リソグラフィ工程で使用される EUV フォトマスクの品質・信頼性・運用健全性を確保する専門エンジニアリングチームの一員として活動します。
プロセスエンジニア、スキャナー装置エンジニア、その他の関係パートナーと密に連携し、フォトマスク認定、コンタミネーション管理、欠陥低減など、EUV パターニング性能に直結する重要業務を主導します。
この役割は、広島サイト(Fab15)における EUV プロセスの安定稼働に不可欠であり、技術調査・改善、データドリブンアプローチ、業務効 率化を通じて、EUV フォトマスクに関連するリスクを プロアクティブに管理すること が求められます。
The F15 ATE (Alpha Technology Engineering) Photo Engineer plays a key role in driving the successful transfer of new technologies from the R&D organization into high‑volume manufacturing, improving yield performance, shortening cycle time, and delivering measurable results through collaboration with all relevant departments and the global DRAM network.
As an ATE Photo EUV Photomask Engineer, you will be part of a specialized engineering team dedicated to ensuring the quality, reliability, and operational integrity of EUV photomasks used in advanced lithography processes.
You will closely collaborate with process engineers, scanner equipment engineers, and other cross‑functional partners to lead critical activities such as photomask qualification, contamination control, and defect reduction—tasks that directly influence EUV patterning performance.
This role is essential for maintaining stable EUV operations at Micron’s Hiroshima Fab (Fab15).
You will be responsible for proactively managing photomask‑related risks—one of the most critical factors in EUV processing—through technical investigation, continuous improvement, data‑driven problem solving, and operational efficiency enhancement.