Introduction to the jobASML/Brion brings together the most creative minds in science and technology to develop computational lithography software to enable customers on the best process window enhancement solution for the next generation HighNA EUV scanner, as well as best process window control solution to mitigate the process variation during the scanner operation, providing holistic solution for advanced nodes in semi-conductor industries.

• Role and responsibilities- Feasibility study of advanced imaging for ASML scanner application, including study the imaging impact with illumination, mask correction, aberration, overlay and mirror/lens heating.

• Design software component to support customer's request on process window enhancement and process window control for ASML scanner application

• Perform qualification test, lead wafer validation and generate proof data, provide training slides, user guide and other technical documents.

• Work with local application engineer to support customer activity, promoting ASML scanner and application adoption.
  Education and experience- Pursuing PhD., or Master's degree in Optics, EE/ME, Physic with experience in optical design, lithography, semiconductor/EDA industry

• Solid understanding of Fourier Optics Imaging and Abbe/Hopkin Imaging Theory

• Knowledge/hands-on experience with Simulation software/technical tools (i.e. Python, Matlab, etc.)

• Experience with rigorous optical simulation is a plus (FDTD, RCWA)

• Soft skill requirements (i.e. strong English communication skills - both written and oral, ability to influence, etc.).

• knowledge of data analytics and machine learning.

• Knowledge in optimization theory, including Convex optimization theory and gradient based optimization .
  Skills- Knowledge/hands-on experience with simulation software/technical tools (i.e. python, matlab, etc.)

• Soft skill requirements (i.e. strong English communication skills - both written and oral, ability to influence, etc.).

• knowledge of data analytics and machine learning.

• Solid understanding of imaging theories (Abbe, Hopkins).

• Direct or indirect experience in OPC (Optical Proximity Correction), including rigorous lithography simulation (Hyperlith, Prolith), RET, and advanced mask technology.

• Experience in lithography or related fields.

• Knowledge in EUV lithography and challenges.

• Knowledge in optimization methods

The current base annual salary range for this role is currently $18.00/hr - $57.00/hr. Pay scales are determined by role, level, location and alignment with market data. Individual pay is determined through interviews and an assessment of several factors that that are unique to each candidate, including but not limited to job-related skills, relevant education and experience, certifications, abilities of the candidate and pay relative to other team members. Our recruiters can share more information about our bonus program, benefits and equity during the hiring process.

Inclusion and diversity

ASML is an Equal Opportunity Employer that values and respects the importance of a diverse and inclusive workforce. It is the policy of the company to recruit, hire, train and promote persons in all job titles without regard to race, color, religion, sex, age, national origin, veteran status, disability, sexual orientation, or gender identity. We recognize that inclusion and diversity is a driving force in the success of our company.

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